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US 6,140,217 AGranted
Technique for extending the limits of photolithography
AssigneeInternational Business Machines Corporation
InventorsHarris C. Jones, James G. Ryan
Life of this patent
Estimating the term…
Abstract
A method of forming a wiring pattern in a device comprises forming an array of grooves in a mask, forming first spacers adjacent vertical walls of the grooves, removing the mask, forming second spacers adjacent the first spacers, and filling areas between the first spacers and areas between the second spacers with a material to form the wiring pattern.
Claims15
A method of forming a wiring pattern in a device comprising:
- forming an array of grooves in a mask;
- forming first spacers adjacent vertical walls of said grooves;
- removing said mask;
- forming second spacers adjacent said first spacers;
- and
- filling areas between said first spacers and areas between said second spacers with a material to form said wiring pattern.
3 more elements
A method of forming a wiring pattern in a device comprising:
- forming an array of grooves in a mask above a substrate;
- depositing a first conformal material over said mask and in said grooves;
- selectively removing a portion of said conformal material such that said first conformal material is removed from horizontal surfaces and remains on vertical surfaces, said first conformal material comprising first spacers;
- removing said mask;
- depositing a second conformal material over said first spacers and said substrate;
- and
- selectively removing a portion of said second conformal material such that said second conformal material comprises second spacers;
- and
- filling areas between said first spacers and areas between said second spacers with a third material to form said wiring pattern.
6 more elements
A method of forming a wiring pattern comprising:
- forming an array of grooves in a substrate;
- forming spacers along vertical walls of said grooves;
- and
- filling areas between said spacers with a material to form said wiring pattern,
- wherein said spacers comprise conductors and said material comprises an insulator.
2 more elements
Dependencies are inferred from the claim text.