Sorbent-based gas storage and delivery system for dispensing of high-purity gas, and apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing same

A process for fabricating an electronic device structure on or in a substrate, comprising:

• providing a storage and dispensing vessel containing a physical sorbent medium having physically adsorbed thereon a fluid for fabrication of the electronic device structure;
• desorbing the fluid from the physical sorbent medium and dispensing the fluid from the storage and dispensing vessel;
• and
• contacting the substrate with the dispensed fluid from the storage and dispensing vessel, under conditions effective to utilize the fluid or a constituent thereof on or in the substrate,
• wherein the storage and dispensing vessel further contains a chemisorbent for impurities of the fluid, whereby the fluid is able to be dispensed in a high purity condition.

A process for fabricating an electronic device structure on or in a substrate, comprising:

• providing a storage and dispensing vessel containing a physical sorbent medium having physically adsorbed thereon a source fluid for a material constituent of the electronic device structure;
• desorbing source fluid from the physical sorbent medium and dispensing source fluid from the storage and dispensing vessel;
• contacting the substrate with dispensed source fluid from the storage and dispensing vessel, under conditions effective to deposit the material constituent on or in the substrate;
• and
• chemisorbing impurities present in the vessel which otherwise would reduce the purity of the dispensed fluid.

A process for fabricating an electronic device structure on or in a substrate, comprising:

• providing a storage and dispensing vessel containing a physical sorbent medium having physically adsorbed thereon a fluid for fabrication of the electronic device structure, which is utilized in the fabrication of the electronic device structure, but which does not form a material constituent of the electronic device structure;
• desorbing the fluid from the physical sorbent medium and dispensing the fluid from the storage and dispensing vessel;
• and
• contacting the substrate with the dispensed fluid from the storage and dispensing vessel, under conditions effective to utilize the fluid or a constituent thereof on or in the substrate,
• wherein the storage and dispensing vessel contains a chemisorbent for impurities of the fluid, whereby the fluid is able to be dispensed in a high purity condition.

A semiconductor manufacturing facility including a semiconductor manufacturing apparatus utilizing a gas reagent, and a gas reagent source therefor that is coupled in gas flow communication with the semiconductor manufacturing apparatus, wherein the gas reagent source comprises:

• a storage and dispensing vessel containing a solid-phase physical sorbent medium having a sorbate gas physically adsorbed thereon;
• a dispensing assembly coupled in gas flow communication with the storage and dispensing vessel, for selectively discharging desorbed sorbate gas from the storage and dispensing vessel;
• and
• optionally a chemisorbent material in the storage and dispensing vessel, having chemisorptive affinity for an impurity of the sorbate gas, and arranged to chemisorb said impurity for gas phase removal thereof in the storage and dispensing vessel.