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US 6,129,546 AGranted
Heat process apparatus and heat process method
AssigneeTokyo Electron Limited
InventorTetsuya Sada
Life of this patent
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AssigneeTokyo Electron Limited
InventorTetsuya Sada
Estimating the term…
Pins that are small protrusions are disposed on the upper surface of a heat process board. Through-holes are formed between the pins so as to deaerate from a space thereof. In a predetermined time period in the initial stage of the heat process, a deaerating process is performed using the through-holes. Thus, a negative pressure is applied to the space between the lower surface of the substrate and the upper surface of the heat process board so as to contact the substrate and the heat process board. Thereafter, the vacuum degree is lowered. Due to the rigidity of the substrate, the substrate and the heat process board are separated. In the initial stage of the heat process, since the substrate and the heat process board directly contact, the temperature of the substrate quickly and equally rises. In addition, when the heat shrinkage is large, since the substrate and the heat process board are separated, static electricity due to friction hardly takes place. Thus, a static breakdown can be prevented. Consequently, a heat process apparatus and a heat process method that allow the entire substrate to be heat-processed are provided.
A heat process apparatus, comprising:
A heat process apparatus, comprising:
A heat process method, comprising the steps of:
A heat process apparatus, comprising:
Dependencies are inferred from the claim text.