Method for manufacturing shadow mask and etching-resistant layer-coating apparatus
AssigneeKabushiki Kaisha Toshiba
InventorsMasaru Nikaido, Yasuhisa Ohtake, Sachiko Hirahara
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AssigneeKabushiki Kaisha Toshiba
InventorsMasaru Nikaido, Yasuhisa Ohtake, Sachiko Hirahara
Estimating the term…
A method of manufacturing a shadow mask by making use of a coating apparatus, wherein a gravure roll 20 mm to 60 mm in diameter is disposed below a metallic thin plate and any supporting member is not disposed at an opposite side portion of the metallic thin plate to be contacted with the gravure roll. An etching resistant liquid is fed onto the gravure roll being rotated in a direction opposite to that of the metallic thin plate and at a peripheral speed of 4 to 25 times as high as that of a feeding speed of the metallic thin plate, and an excessive portion of the etching resistant liquid is wiped away by the doctor blade before the etching resistant liquid is transferred to the metallic thin plate thereby to form an etching resistant layer on the metallic thin plate.
A method of manufacturing a shadow mask, said method comprising:
A method of manufacturing a shadow mask, said method comprising:
Dependencies are inferred from the claim text.