Method for manufacturing low work function surfaces
AssigneeBorealis Technical Limited
InventorsIsaiah Watas Cox, Avto Tavkhelidze, Jonathan Sidney Edelson, Stuart Harbron
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Abstract
Methods for fabricating nano-structured surfaces having geometries in which the passage of elementary particles through a potential barrier is enhanced are described. The methods use combinations of electron beam lithography, lift-off, and rolling, imprinting or stamping processes.
Claims20
A process for making an elementary particle emitting surface, comprising the steps of:
- a. positioning into the path of a particle beam a layer of material whose molecules are modified when exposed to said particle beam,
- b. directionally focusing said particle beam on said material and exposing a pattern of molecules to the beam such that the modified molecules and the unmodified molecules of said material form a pattern that comprises an indented cross-section comprising protruding portions separated by spaces, and further wherein the depths of indents in said indented cross-section is given by the relationship n.lambda.+.lambda./4, where .lambda. is the de Broglie wavelength for said elementary particles and where n is 0 or a positive integer selected such that the geometric shape of said indented cross-section causes de Broglie interference between said elementary particles,
- c. developing said material to remove either said modified molecules or said unmodified molecules, whereby molecules not removed by said developing form at least said protruding portions of said indented cross-section,
- d. transferring said pattern of said indented cross-section to a surface of a substrate whereby said indented cross-section is created on said substrate.
A process for preparing an elementary particle emitting surface having a geometrical shape for causing de Broglie interference between said elementary particles, comprising the steps of:
- a. providing a metal substrate,
- b. etching said metal substrate by oxygen atom beam etching means to give an oxide pattern,
- c. dissolving said oxide to give a substrate having said predetermined lattice pattern.
A process for preparing an elementary particle emitting surface having a geometrical shape for causing de Broglie interference between said elementary particles, comprising the steps of:
- a. providing a metal substrate,
- b. etching said metal substrate by oxygen atom beam etching means to give an oxide pattern,
- c. subjecting the substrate to isotropic oxidation, yielding a flat surface having indented oxide regions, which provide a potential energy barrier causing de Broglie interference between said elementary particles.
Dependencies are inferred from the claim text.