Electrolyte for the galvanic deposition of low-stress, crack-resistant ruthenium layers
AssigneeDegussa-Huls AG
InventorsRenate Freudenberger, Andreas Zielonka
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Abstract
An electrolyte for the galvanic deposition of stress-relieved, crack-resistant ruthenium layers containing ruthenium in complexed form. The additive for the electrolyte is pyridine or an N-alkylated pyridinium salts of formula I ##STR1## wherein R.sup..crclbar. is --(CH.sub.2).sub.3 --SO.sub.3.sup..crclbar., --CH.sub.2 --CHOH--CH.sub.2 --SO.sub.3.sup..crclbar., or ##STR2## R' and H is, alkyl with 1-6 C atoms, --CH.dbd.CH.sub.2, or --CO.sub.2 Na.
Claims18
An electrolyte for the galvanic deposition of stress-relieved, crack-resistant ruthenium layers on an object, said electrolyte containing ruthenium in a form complexed with amidosulfuric acid, wherein said electrolyte contains as an additive pyridine or an N-alkylated pyridinium salt represented by the structural formula I ##STR5## wherein R.sup..crclbar. is a member selected from the group consisting of --(CH.sub.2).sub.3 --SO.sub.3.sup..crclbar., --CH.sub.2 --CHOH--CH.sub.2 --CH.sub.2 --SO.sub.3.sup..crclbar., and ##STR6## and R' is a member selected from the group consisting of H, alkyl with 1-6 C atoms, --CH.dbd.CH.sub.2, and --CO.sub.2 Na.
The method of using pyridine or an N-alkylated pyridinium salt of formula I ##STR7## wherein R.sup..crclbar. is a member selected from the group consisting of:
- --(CH.sub.2).sub.3 --SO.sub.3.sup..crclbar., --CH.sub.2 --CHOH--CH.sub.2 --SO.sub.3.sup..crclbar., and ##STR8## and R' is a member selected from the group consisting of H, alkyl with 1-6 C atoms, --CH.dbd.CH.sub.2, and --CO.sub.2 Na
- as an additive in an electrolyte containing ruthenium in a form complexed with amidosulfuric acid for the galvanic deposition of stress-relieved, crack-resistant ruthenium layers comprising adding said additive to the electrolyte or to ingredients used to prepare the electrolyte.
Dependencies are inferred from the claim text.