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US 6,090,771 AGranted
Low residue aqueous hard surface cleaning and disinfecting compositions
AssigneeReckitt Benckiser N.V.
InventorsDiane Joyce Burt, Kenneth A. Harrison, Ann Marie Lynch, Jeanne Marie Weller
Life of this patent
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Abstract
Aqueous based cleaning compositions simultaneously featuring disinfecting, low residue deposit and good cleaning characteristics are provided. The compositions include one or more quaternary amine compounds as disinfecting active agents, an organic solvent system which includes glycol mono-n-butyl ether or a binary system including a glycol ether with a linear primary alcohol, and either one or more betaines, or one or more amine oxides as a surfactant constituent.
Claims10
A low residue aqueous cleaning and disinfecting composition comprising, per 100% wt.:
- A) 0.05-0.3% wt. of a quaternary ammonium surfactant compound having germicidal properties;
- B) 0.05-10% wt. of a solvent system selected from:
- a propylene glycol n-butyl ether solvent, or a binary solvent combination of a glycol ether with a C.sub.8 -C.sub.18 linear primary alcohol;
- C) 0.2-3.0% wt. of a surfactant compound selected from amine oxide compounds;
- D) in excess of 0.5% wt. of one or more alkanolamines;
- E) to 100% wt. water.
3 more elements
Dependencies are inferred from the claim text.