Lead silicate based capacitor structures
AssigneeInternational Business Machines Corporation
InventorsRobert Benjamin Laibowitz, Thomas McCarroll Shaw
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AssigneeInternational Business Machines Corporation
InventorsRobert Benjamin Laibowitz, Thomas McCarroll Shaw
Estimating the term…
A capacitor and method of making is described incorporating a semiconductor substrate, a bottom electrode formed on or in the substrate, a dielectric layer of barium or lead silicate, and a top electrode. A sandwich dielectric of a barium or lead silicate and a high dielectric constant material such as barium or lead titanate may comprise the dielectric. The silicate layer may be formed by evaporating and diffusing, ion implanting, or electroplating and diffusing barium or lead. The high epsilon dielectric constant material may be formed by sol gel deposition, metal organic chemical vapor deposition or sputtering. The invention overcomes the problem of a bottom electrode and dielectric layer which chemically interact to form a silicon oxide layer in series or below the desired dielectric layer.
A method of forming a capacitor comprising the steps of:
A method of forming an array of capacitors comprising the steps of:
Dependencies are inferred from the claim text.