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US 6,063,514 AGranted
Gas-tight article and a producing process thereof
AssigneeNGK Insulators, Ltd.
InventorsMasao Nishioka, Yasufumi Aihara, Keiichiro Watanabe
Life of this patent
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Abstract
A gas-tight article includes a sintered body composed mainly of a silicon carbide, and a film of silicon carbide formed on a surface of the sintered body by chemical vapor deposition and covering said surface of the sintered body, wherein cracks are formed in the film of the silicon carbide, and the cracks are filled with metallic silicon.
Claims5
A gas-tight article comprising:
- a sintered body comprising silicon carbide, and a film of silicon carbide formed on a surface of said sintered body by chemical vapor deposition;
- wherein said film comprises regions of metallic silicon which fill cracks generated in said film.
Dependencies are inferred from the claim text.