Processing apparatus and method using solution
AssigneeTokyo Electron Limited
InventorsNorio Semba, Junichi Kitano, Takayuki Katano
Life of this patent
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Abstract
A processing apparatus using solution comprises a rotary table which rotates while holding a substrate thereon, in the processing chamber provided in the casing, a supply mechanism for supplying a processing solution to a surface of the substrate held on the rotary table, and an impurity remover unit, provided outside the casing, wherein the impurity remover unit includes a cleaning unit for cleaning an object gas introduced from the inlet opening by brining it into contact with an impurity remover solution, and the gas-liquid separation mechanism for separating liquid from gas in an exhaust is provided in the exhaust system for exhausting the casing.
Claims17
A processing apparatus using solution comprising:
- a casing in which at least one processing chamber is provided;
- a rotary table which rotates while holding a substrate thereon, in the processing chamber provided in said casing;
- a supply mechanism for supplying a processing solution to a surface of the substrate held on said rotary table;
- a gas-liquid separation mechanism, provided in an exhaustion system for exhausting the casing, for separating liquid in an exhaust from gas;
- and
- an impurity remover unit, coupled to said casing, for cleaning unclean gas in said casing;
- wherein said impurity remover unit further comprises:
- a gas inlet opening connected to a gas exit of said gas-liquid separation mechanism;
- a cleaning unit for cleaning an object gas introduced from said inlet opening by bringing it into contact with an impurity remover solution;
- and
- supplying means for supplying thus cleaned gas into said casing.
A processing apparatus using solution comprising:
- a casing in which at least one processing chamber is provided;
- a rotary table which rotates while holding a substrate thereon, in the processing chamber provided in said casing;
- a supply mechanism for supplying a processing solution to a surface of the substrate held on said rotary table;
- a gas-liquid separation mechanism, provided in an exhaust system for exhausting the casing, for separating liquid in an exhaust from gas;
- and
- an impurity remover unit, coupled to said casing, for cleaning unclean gas in said casing;
- wherein said impurity remover unit further comprises:
- a gas inlet opening connected to a gas exit of said gas-liquid separation mechanism;
- a cleaning unit for cleaning an object gas introduced from said inlet opening by bringing it into contact with an impurity remover solution;
- a temperature/humidity adjusting unit for adjusting a temperature and a humidity of the cleaned gas;
- and
- supplying means for supplying thus cleaned gas into said casing.
The processing method using solution comprising the steps of:
- supplying a processing solution onto a surface of a substrate being rotated while holding the substrate in a processing chamber provided in a casing;
- separating liquid and gas of an exhaust in said casing;
- cleaning the separated gas by bringing it into contact with an impurity remover solution;
- and
- returning the cleaned gas into said casing.
A processing method using solution comprising the steps of:
- supplying a processing solution onto a surface of a substrate being rotated while holding the substrate in a processing chamber provided in a casing;
- separating liquid and gas of an exhaust in said casing;
- cleaning the separated gas by bringing it into contact with an impurity remover solution;
- adjusting a temperature and a humidity of the cleaned gas;
- and
- returning the cleaned gas whose temperature and humidity adjusted, into said casing.
Dependencies are inferred from the claim text.