Coating apparatus
AssigneesTokyo Electron Limited, Kabushiki Kaisha Toshiba
InventorsTakahiro Kitano, Katsuya Okumura, Shinichi Ito
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AssigneesTokyo Electron Limited, Kabushiki Kaisha Toshiba
InventorsTakahiro Kitano, Katsuya Okumura, Shinichi Ito
Estimating the term…
A coating apparatus according to the invention comprises a spin chuck for holding a substrate, resist solution tanks which contain a primary resist solution, a thinner tank which contains thinner, a confluence valve communicating with the thinner tank and the resist solution tanks, first pumps each for supplying the confluence valve with the primary resist solution from a corresponding one of the resist solution tanks, a second pump for supplying thinner from the thinner tank to the confluence valve, a mixer for mixing the primary treatment solution and thinner supplied from the confluence valve, a nozzle for applying a solution from the mixer, to the substrate held by the spin chuck, and a controller for controlling the first and second pumps to adjust the mixture ratio of the primary resist solution to be supplied from each of the resist solution tanks to the confluence valve, to thinner to be supplied from the thinner tank to the confluence valve.
A coating apparatus configured to coat a substrate with a treatment solution, comprising:
Dependencies are inferred from the claim text.