Electron-beam data generating apparatus

An electron-beam data generating apparatus for generating electron-beam data used for creating a mask for a layout pattern of a semiconductor integrated circuit, the apparatus comprising:

• a plurality of processing circuits connected in parallel;
• a data processing unit for parallel data processing of a layout pattern of a semiconductor integrated circuit based on at least one of design layers of the semiconductor integrated circuit, processes used in fabricating a mask for the layout pattern, and segments, each segment serving as an electron-beam radiation region of the mask, by dividing the data processing and assigning divided portions of the data processing to respective processing circuits, the data processing unit including a hierarchy developing unit for developing, in parallel processing, a hierarchy of the layout pattern for the respective design layers by assigning the developing to respective processing circuits;
• and
• a format converting unit for converting data processed by the data processing unit into electron-beam data and outputting the electron-beam data.