Well to substrate photodiode for use in a CMOS sensor on a salicide process
AssigneeIntel Corporation
InventorsBart McDaniel, Mark A. Beiley, Lawrence T. Clark, Eric J. Hoffman, Edward J. Bawolek
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AssigneeIntel Corporation
InventorsBart McDaniel, Mark A. Beiley, Lawrence T. Clark, Eric J. Hoffman, Edward J. Bawolek
Estimating the term…
An image sensor having a well-to-substrate diode as the photodetector. In a preferred embodiment, a modern salicided (CMOS) process is utilized to manufacture the image sensor. The field oxide region above the diode junction is transparent to visible light, thus allowing the photodiode competitive quantum efficiency as compared to devices having source/drain diffusion-to-substrate photodiodes fabricated on a non-salicided process. The photodiode can be integrated as part of a sensor array with digital circuitry using a relatively unmodified digital CMOS process. Furthermore, the structure allows the optical properties of the photodiode to be engineered by modifying the well without deleterious effects, to approximate a first order, on the characteristics of a FET built in another identical well.
A photodiode for converting incident optical signals into electrical signals, comprising:
A photocell electrically responsive to incident light, comprising:
The photocell of claim 11 wherein the reset circuitry comprises a MOS FET formed in the substrate adjacent to the photodiode, the MOS FET configured as a switch for applying and removing a reverse bias to the photodiode.
An image sensor IC comprising:
An image capturing system, comprising:
A photodiode for converting incident light into electrical signals, comprising:
Dependencies are inferred from the claim text.