Apparatus and method for depositing a semiconductor material

Apparatus for depositing a semiconductor material on a glass sheet substrate, comprising:

• a distributor including a tubular permeable member of silicon carbide having an elongated shape along which an electrical current flows to provide heating;
• a pair of material supplies for introducing a carrier gas and an entrained powder of a semiconductor material into opposite ends of the tubular permeable member for heating to provide a vapor that passes outwardly through the tubular permeable member;
• a shroud of a tubular shape that receives the tubular permeable member, and the shroud having an opening formed as a slit through which the vapor passes outwardly;
• and
• a conveyor for conveying a glass sheet substrate below the distributor for deposition of the vapor on the substrate as a semiconductor layer.

A method for depositing a semiconductor material on a glass sheet substrate, comprising:

• heating a permeable member;
• passing a carrier gas and a semiconductor material through the heated permeable member for heating to provide a vapor;
• and
• conveying a glass sheet substrate adjacent the heated permeable member for deposition of the vapor on the glass sheet substrate as a semiconductor layer.