Chemically amplified resist

Abstract

To provide chemically amplified resist which is excellent in resolution, focusing and size accuracy as well by eliminating problem of the tapered resist pattern owing to the photo-absorption, and gives, at the same time, high thermal stability and sufficient resistance against dry-etching, resin having an aromatic ring is added in chemically amplified resist comprising a alicyclic acrylic polymer and a photoacid generator. As to the resin having the aromatic ring, it is preferably a polyhydroxystyrene polymer, a novolac polymer or a t-BOC protected polyhydroxystyrene polymer. Preferable additive amount of these polymers is 1 to 10 parts by weight to 100 parts of base polymer.

Dependencies are inferred from the claim text.