Vapor deposition routes to nanoporous silica
AssigneeAlliedSignal Inc.
InventorsDouglas M. Smith, Teresa Ramos, Kevin H. Roderick
Life of this patent
Estimating the term…
Abstract
A process for the manufacture of nanoporous silica dielectric films by vapor deposition of silica precursors on a substrate. The process provides for vaporizing at least one alkoxysilane composition; depositing the vaporized alkoxysilane composition onto a substrate; exposing the deposited alkoxysilane composition to a water vapor, and either an acid or a base vapor; and drying the exposed alkoxysilane composition, thereby forming a relatively high porosity, low dielectric constant, silicon containing polymer composition on the substrate.
Claims24
A process for forming a nanoporous dielectric coating on a substrate which comprises
- a) vaporizing at least one alkoxysilane composition;
- b) depositing the vaporized alkoxysilane composition onto a substrate;
- c) exposing the deposited alkoxysilane composition to a water vapor, and either an acid or a base vapor;
- and
- d) drying the exposed alkoxysilane composition, thereby forming a relatively high porosity, low dielectric constant, silicon containing polymer composition on the substrate.
Dependencies are inferred from the claim text.