Substrate treating apparatus and method for treating substrate
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsMitsuaki Yoshitani, Eiichi Wada, Makoto Mori, Iwao Tanaka, Yoshihiko Matsushita
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AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsMitsuaki Yoshitani, Eiichi Wada, Makoto Mori, Iwao Tanaka, Yoshihiko Matsushita
Estimating the term…
A substrate treating apparatus for successively treating substrates includes a body having a carrying unit for carrying the substrate along a carrying surface. The carrying surface is inclined in a plane perpendicular to the carrying direction of the substrate. The body supplies a treating liquid to the substrate being carried for treating the substrate. A receiving station is disposed upstream of the body for changing the posture of the substrate from a horizontal posture to an inclined posture corresponding to the inclination of the carrying surface, and for forwarding the substrate onto the carrying unit. In addition, a delivering station is disposed downstream of the body for returning the substrate forwarded from the carrying unit in the inclined posture to the horizontal posture.
A substrate treating apparatus for treating substrates successively, comprising:
A substrate treating apparatus for treating substrates successively, comprising:
A substrate treating apparatus for treating substrates successively, comprising:
A substrate treating apparatus for treating substrates successively, comprising:
Dependencies are inferred from the claim text.