Lid assembly for high temperature processing chamber

An apparatus for fabricating an integrated circuit device comprising:

• an enclosure housing a processing chamber
• a gas mixing block attached to the enclosure and having an outlet coupled to the processing chamber and first and second gas inlets;
• a source of cleaning gas fluidly coupled to the gas mixing block;
• a source of process gas fluidly coupled to the gas mixing block;
• a valve coupled to the gas mixing block for selectively fluidly coupling the source of cleaning gas and the source of process gas with the gas mixing block to selectively allow cleaning gases or process gases into the processing chamber;
• a base plate having a gas inlet coupled to the gas mixing block;
• a gas distribution plate including a plurality of gas distribution holes fluidly coupled to the gas inlet for dispersing the gases into the chamber;
• and
• a bypass passage coupled to the gas inlet and the processing chamber, the bypass passage offering less resistance to fluid flow than the gas distribution holes for allowing at least a portion of the gases to bypass the gas distribution holes into the chamber.