Nitride-based semiconductor element and method for manufacturing the same
AssigneeKabushiki Kaisha Toshiba
InventorsLisa Sugiura, Masayuki Ishikawa, Shinya Nunoue, Masaaki Onomura, Masahiro Yamamoto
Life of this patent
Estimating the term…
Loading patent…
AssigneeKabushiki Kaisha Toshiba
InventorsLisa Sugiura, Masayuki Ishikawa, Shinya Nunoue, Masaaki Onomura, Masahiro Yamamoto
Estimating the term…
Nitride-based semiconductor element comprises a first layer, a mask formed on the first layer and has a plurality of opening portions, a nitride-based compound semiconductor layer formed on the mask, the nitride-based compound semiconductor layer including a first region having threading dislocations produced in such a manner that, in approximately a middle portion between two adjacent ones of the plurality of opening portions in the mask, a plurality of dislocations extend in a vertical direction to a surface of the mask, and a second region which comprises portions other than the middle portions and free from the dislocations, and a desired element structure formed on the semiconductor layer.
A nitride-based semiconductor element comprising:
A nitride-based light emitting element comprising:
A nitride-based semiconductor element comprising:
Dependencies are inferred from the claim text.