Tantalum amide precursors for deposition of tantalum nitride on a substrate

A source reagent composition comprising at least one tantalum and/or titanium species selected from the group consisting of:

• (i) tethered amine tantalum complexes of the formula:
• ##STR16## wherein:
• X is 2 or 3;
• each of R.sub.1 -R.sub.5 is independently selected from the group consisting of H, C.sub.1 -C.sub.4 alkyl, aryl C.sub.1 -C.sub.6 perfluoroalkyl and trimethylsilyl;
• (ii) .beta.-diimines of the formula:
• TaG.sub.x Q.sub.5-x
• wherein:
• G is a .beta.-diimino ligand;
• each Q is selected from the group consisting of H, C.sub.1 -C.sub.6 alkyl, aryl and C.sub.1 -C.sub.6 perfluoroalkyl;
• and
• x is an integer from 1 to 4 inclusive;
• (iii) tantalum diamide complexes of the formula
• Ta(N(R.sub.1)(CH.sub.2).sub.x N(R.sub.2)).sub.y (NR.sub.3 R.sub.4).sub.5-2y
• wherein:
• x is 1 or 2;
• y is 1 or 2;
• each of R.sub.1 -R.sub.4 is independently selected from the group consisting of H, C.sub.1 -C.sub.4 alkyl, aryl, perfluoroalkyl, and trimethylsilyl;
• (iv) tantalum amide compounds of the formula
• Ta(NRR').sub.5
• wherein each R and R' is independently selected from the group consisting of H, C.sub.1 -C.sub.4 alkyl, phenyl, perfluoroalkyl, and trimethylsilyl, subject to the proviso that in each NRR' group
• R.noteq.R';
• (v) .beta.-ketoimines of the formula ##STR17## wherein each of R.sub.1, R.sub.2, R.sub.a, R.sub.b, R.sub.c and R.sub.d is independently selected from H, aryl, C.sub.1 -C.sub.6 alkyl, and C.sub.1 -C.sub.6 perfluoroalkyl;
• and
• (vi) tantalum cyclopentadienyl compounds of the formula:
• ##STR18## wherein each R is trimethylsilyl;
• (vii) Ta(NR.sub.1 R.sub.2).sub.x (NR.sub.3 R.sub.4).sub.5-x /Ti(NR.sub.1 R.sub.2).sub.x (NR.sub.3 R.sub.4).sub.4-x
• where each of R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are independently selected form the group consisting of H, C.sub.1 -C.sub.8 alkyl, aryl, C.sub.1 -C.sub.8 perfluoroalkyl or a silicon-containing group selected from the group consisting of silane, alkylsilane, perfluoroalkylsilyl, triarylsilane and alkylsilylsilane, x is from 0 to 5 in the tantalum compound and x is from 1 to 4 in the titanium compound, subject to the proviso that in the titanium compound, when R.sub.1 and R.sub.2 are each methyl, then R.sub.3 and R.sub.4 are not both propyl;
• (viii) Ta(NR.sub.1)(NR.sub.2 R.sub.3).sub.3
• where each of R.sub.1, R.sub.2, R.sub.3 are independently selected from the group consisting of H, C.sub.1 -C.sub.8 alkyl aryl, C.sub.1 -C.sub.8 perfluoroalkyl or a silicon-containing group selected from the group consisting of silane, alkylsilane, perfluoroalkylsilyl, triarylsilane and alkylsilylsilane;
• (ix) Ta(SiR.sub.1 R.sub.2 R.sub.3).sub.x (NR.sub.4 R.sub.5).sub.5-x /Ti(SiR.sub.1 R.sub.2 R.sub.3).sub.x (NR.sub.4 R.sub.5).sub.4-x
• where x is from 0 to 5 in the tantalum compound, x is from 1 to 4 in the titanium compound, each of R.sub.1-5 is independently selected from the group consisting of H, Me, Et, .sup.t Bu, Ph, .sup.i Pr, CF.sub.3, SiH.sub.3, SiMe.sub.3, Si(CF.sub.3).sub.3, Si(Et).sub.3, Si(.sup.i Pr).sub.3, Si(.sup.t Bu).sub.3, Si(Ph).sub.3, and Si(SiMe.sub.3).sub.x (Me).sub.3-x where x is from 0 to 3, and subject to the proviso that in the titanium compound, when R.sub.4 and R.sub.5 are each methyl, then R.sub.1, R.sub.2, and R.sub.3 are not all trimethylsilyl;
• and
• (x) (Cp.sup.n)Ta(SiR.sub.1 R.sub.2 R.sub.3).sub.x (NR.sub.4 R.sub.5).sub.4-x /(Cp.sup.n).sub.2 Ti(SiR.sub.1 R.sub.2 R.sub.3)(NR.sub.4 R.sub.5)
• where x is from 0 to 4, each of R.sub.1-5 is independently selected from the group consisting of H, Me, Et, .sup.t Bu, Ph, .sup.i Pr, CF.sub.3, SiH.sub.3, SiMe.sub.3, Si(CF.sub.3).sub.3, Si(Et).sub.3, Si(.sup.i Pr).sub.3, Si(.sup.t Bu).sub.3, Si(Ph).sub.3, Si(SiMe.sub.3).sub.x (Me).sub.3-x and Cp.sup.n is C.sub.5 H.sub.x Me.sub.(5-x) (where x=0-5).