Cryogenic polishing method for soft acrylic articles

Abstract

A method for polishing articles comprising soft acrylic materials is disclosed. The method includes a cryogenic polishing step and a cleaning step. In the polishing step, a receptacle is charged with polishing beads of various sizes, sodium bicarbonate, a swelling agent and the articles to be polished, for a period of time and at a rotation speed sufficient to remove surface irregularities. Following the polishing step, a receptacle is charged with (a) a cleaning slurry comprising cleaning beads of various sizes and (i) sodium hydroxide and water or (ii) alumina, a surfactant and a solvent and (b) the articles to be cleaned, for a period of time and at a rotation speed sufficient to clean the surface of the polished articles. Agitation is preferably accomplished by a tumbling machine.

Dependencies are inferred from the claim text.