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AssigneeWisconsin Alumni Research Foundation
InventorsFranco Cerrina, Thomas B. Lucatorto
Estimating the term…
Inspection of objects such as X-ray lithography masks is carried out by passing X-rays or extreme ultraviolet light through an object which absorbs in a pattern to provide a patterned X-ray or ultraviolet image which is then directed to a converter. The converter converts the image incident upon it to an image formed by electrons emitted from the converter. The emitted electrons are magnified in an electron microscope and the magnified electron image is displayed by the electron microscope. The visible image may be further digitized and processed by a computer, including long-term storage or display on a computer monitor. X-ray lithography masks may be inspected by passing X-rays through masks of the same type that will be used for lithography so that the magnified image of the X-rays passed through the masks corresponds to the pattern of X-rays that will be incident on a photoresist, allowing accurate inspection of X-ray masks before use.
Apparatus for the inspection of an X-ray mask including an X-ray transparent substrate layer that allows X-rays to pass relatively unimpeded therethrough and X-ray absorbers positioned on the substrate layer in an absorber pattern through which X-rays are passed in a pattern, comprising:
A method for inspection of an X-ray lithography mask having a substrate layer and X-ray absorber material formed on the substrate in a pattern by X-rays, comprising the steps of:
A method for inspection of a lithography mask having material formed thereon for patterning radiation incident on the mask, comprising the steps of:
Dependencies are inferred from the claim text.