Rotary plater with radially distributed plating solution

A plating apparatus comprising:

• a plating bowl for providing a first portion of a plating solution;
• a circular plating cup located in the plating bowl for providing a second portion of the plating solution, the plating cup having top and bottom portions and a top circular rim that is centered about a vertical axis;
• a conduit and a pump interconnecting the plating bowl to a bottom portion of the plating cup to recirculate the plating solution by transfer from the plating bowl to the bottom portion of the plating cup, then upwardly in the plating cup and over the circular rim back into the plating bowl;
• an anode located within the bottom portion of the plating cup and a cathode located adjacent the top portion of the plating cup, the cathode being capable of supporting a workpiece with a plating surface of the workpiece facing downwardly to receive an upward flow of the plating solution;
• a plating solution distributor located in the plating cup between the anode and the cathode in a spaced relationship therebetween and centered about said vertical axis;
• a motor for relatively rotating the cathode and the plating solution distributor with respect to one another;
• the plating solution distributor for distributing the plating solution over said plating surface of the workpiece at a volume that increases radially away from said vertical axis;
• the conduit having an outlet for discharging the plating solution into a region between the anobe and the plating solution disteibutor;
• said plating solution distributor including:
• a flat circular plate centered about said vertical axis, the plate having a plurality of apertures for transferring plating solution from said region to the cathode and plating surface of the workpiece;
• and
• each aperture increasing in size along a radial from said vertical axis to a periphery of the plate.

A method of plating a workpiece that has a flat plating surface in a plating apparatus, the plating apparatus including a circular plating cup located in a plating bowl, the plating cup having a top located circular rim centered on a vertical axis, the plating cup and plating bowl containing a plating solution, an anode fixed in a bottom portion of the plating cup and a cathode located in a top portion of the plating cup, the cathode mounting the workpiece with the plating surface facing downwardly in the plating solution, a conduit and pump for recirculating the plating solution by circulating the plating solution from the plating bowl to the plating cup, then upwardly in the plating cup to the plating surface and over the rim of the plating cup back into the plating bowl, the method comprising:

• during circulation of the plating solution between the anode and the plating surface, capturing the plating solution and discharging the plating solution toward the plating surface with an increase in volume that corresponds to an increase in distance from the vertical axis;
• said capturing including receiving the plating solution in a plurality of arms between the anode and the plating surface and said discharging including discharging the plating solution toward the plating surface from openings in the arms which increase in size with a corresponding increase in distance of the openings from the vertical axis;
• and
• relatively rotating the cathode and the arms with respect to one another.

A method of plating a workpiece that has a flat plating surface in a plating apparatus, the plating apparatus including a circular plating cup located in a plating bowl, the plating cup having a top located circular rim centered on a vertical axis, the plating cup and plating bowl containing a plating solution, an anode fixed in a bottom portion of the plating cup and a cathode located in a top portion of the plating cup, the cathode mounting the workpiece with the plating surface facing downwardly in the plating solution, a conduit and pump for recirculating the plating solution by circulating the plating solution from the plating bowl to the plating cup, then upwardly in the plating cup to the plating surface and over the rim of the plating cup back into the plating bowl, the method comprising:

• during circulation of the plating solution between the anode and the plating surface, capturing the plating solution and discharging the plating solution toward the plating surface with an increase in volume that corresponds to an increase in distance from the vertical axis;
• said capturing including receiving the plating solution in a plurality of arms between the anode and the plating surface and said discharging including discharging the plating solution toward the plating surface from openings in the arms which increase in size with a corresponding increase in distance of the openings from the vertical axis;
• and
• rotating the arms about the vertical axis.

A method of plating a workpiece that has a flat plating surface in a plating apparatus, the plating apparatus including a circular plating cup located in a plating bowl, the plating cup having a top located circular rim centered on a vertical axis, the plating cup and plating bowl containing a plating solution, an anode fixed in a bottom portion of the plating cup and a cathode located in a top portion of the plating cup, the cathode mounting the workpiece with the plating surface facing downwardly in the plating solution, a conduit and pump for recirculating the plating solution by circulating the plating solution from the plating bowl to the plating cup, then upwardly in the plating cup to the plating surface and over the rim of the plating cup back into the plating bowl, the method comprising:

• during circulation of the plating solution between the anode and the plating surface, capturing the plating solution and discharging the plating solution toward the plating surface with an increase in volume that corresponds to an increase in distance from the vertical axis;
• said capturing including receiving the plating solution in a plurality of arms between the anode and the plating surface and said discharging including discharging the plating solution toward the plating surface from openings in the arms which increase in size with a corresponding increase in distance of the openings from the vertical axis;
• and
• holding the cathode and plating surface stationary while the anns rotate about the vertical axis.

A method of plating a workpiece that has a flat plating surface in a plating apparatus, the plating apparatus including a circular plating cup located in a plating bowl, the plating cup having a top located circular rim centered on a vertical axis, the plating cup and plating bowl containing a plating solution, an anode fixed in a bottom portion of the plating cup and a cathode located in a top portion of the plating cup, the cathode mounting the workpiece with the plating surface facing downwardly in the plating solution, a conduit and pump for recirculating the plating solution by circulating the plating solution from the plating bowl to the plating cup, then upwardly in the plating cup to the plating surface and over the rim of the plating cup back into the plating bowl, the method comprising:

• during circulation of the plating solution between the anode and the plating surface, capturing the plating solution and discharging the plating solution toward the plating surface with an increase in volume that corresponds to an increase in distance from the vertical axis;
• said capturing and discharging including passing the plating solution through radially extending apertures in a flat plate between the anode and the plating surface, each aperture increasing in size with a corresponding increase in distance from the vertical axis;
• and
• relatively rotating the cathode and the flat plate with respect to one another.

A method of plating a workpiece that has a flat plating surface in a plating apparatus, the plating apparatus including a circular plating cup located in a plating bowl, the plating cup having a top located circular rim centered on a vertical axis, the plating cup and plating bowl containing a plating solution, an anode fixed in a bottom portion of the plating cup and a cathode located in a top portion of the plating cup, the cathode mounting the workpiece with the plating surface facing downwardly in the plating solution, a conduit and pump for recirculating the plating solution by circulating the plating solution from the plating bowl to the plating cup, then upwardly in the plating cup to the plating surface and over the rim of the plating cup back into the plating bowl, the method comprising:

• during circulation of the plating solution between the anode and the plating surface, capturing the plating solution and discharging the plating solution toward the plating surface with an increase in volume that corresponds to an increase in distance from the vertical axis;
• said capturing and discharging including passing the plating solution through radially extending apertures in a flat plate between the anode and the plating surface, each aperture increasing in size with a corresponding increase in distance from the vertical axis;
• and
• rotating the flat plate about the vertical axis.

A method of plating a workpiece that has a flat plating surface in a plating apparatus, the plating apparatus including a circular plating cup located in a plating bowl, the plating cup having a top located circular rim centered on a vertical axis, the plating cup and plating bowl containing a plating solution, an anode fixed in a bottom portion of the plating cup and a cathode located in a top portion of the plating cup, the cathode mounting the workpiece with the plating surface facing downwardly in the plating solution, a conduit and pump for recirculating the plating solution by circulating the plating solution from the plating bowl to the plating cup, then upwardly in the plating cup to the plating surface and over the rim of the plating cup back into the plating bowl, the method comprising:

• during circulation of the plating solution between the anode and the plating surface, capturing the plating solution and discharging the plating solution toward the plating surface with an increase in volume that corresponds to an increase in distance from the vertical axis;
• said capturing and discharging including passing the plating solution through radially extending apertures in a flat plate between the anode and the plating surface, each aperture increasing in size with a corresponding increase in distance from the vertical axis;
• and
• holding the cathode stationary while rotating the flat plate about the vertical axis.

A plating apparatus comprising:

• a plating bowl for providing a first portion of a plating solution;
• a circular plating cup located in the plating bowl for providing a second portion of the plating solution, the plating cup having top and bottom portions and a top circular rim that is centered about a vertical axis;
• a conduit and a pump interconnecting the plating bowl to a bottom portion of the plating cup to recirculate the plating solution by transfer from the plating bowl to the bottom portion of the plating cup, then upwardly in the plating cup and over the circular rim back into the plating bowl;
• an anode located within the bottom portion of the plating cup and a cathode located adjacent the top portion of the plating cup, the cathode being capable of supporting a workpiece with a plating surface of the workpiece facing downwardly to receive an upward flow of the plating solution;
• a plating solution distributor located in the plating cup between the anode and the cathode in a spaced relationship therebetween and centered about said vertical axis;
• a motor for relatively rotating the cathode and the plating solution distributor with respect to one another;
• the plating solution distributor for distributing the plating solution over said plating surface of the workpiece at a volume that increases radially away from said vertical axis;
• an annular thief centered about the vertical axis and divided into discrete spaced apart thief segments that are located about the cathode;
• and
• a source connected to each thief segment for applying differential currents to the thief segments.

A plating apparatus comprising:

• a plating bowl for providing a first portion of a plating solution;
• a circular plating cup located in the plating bowl for providing a second portion of the plating solution, the plating cup having top and bottom portions and a top circular rim that is centered about a vertical axis;
• a conduit and a pump interconnecting the plating bowl to a bottom portion of the plating cup to recirculate the plating solution by transfer from the plating bowl to the bottom portion of the plating cup, then upwardly in the plating cup and over the circular rim back into the plating bowl;
• an anode located within the bottom portion of the plating cup and a cathode located adjacent the top portion of the plating cup, the cathode being capable of supporting a workpiece with a plating surface of the workpiece facing downwardly to receive an upward flow of the plating solution;
• a plating solution distributor located in the plating cup between the anode and the cathode in a spaced relationship therebetween and centered about said vertical axis;
• a motor for relatively rotating the cathode and the plating solution distributor with respect to one another;
• the plating solution distributor for distributing the plating solution over said plating surface of the workpiece at a volume that increases radially away from said vertical axis;
• the plating solution distributor including:
• a hollow central hub centered about said vertical axis and connected to the conduit and the pump for receiving the plating solution;
• a plurality of hollow arms connected to the central hub and radially extending therefrom, the hollow arms in fluid communication with the central hub for receiving the plating solution therefrom;
• each hollow arm having a plurality of top located openings for facing the plating surface of the workpiece;
• and
• the openings in each arm increasing in size from the hub to a terminal end of the arm so that each arm discharges an increasing volume of plating solution from the hub to said terminal end;
• an annular thief centered about the vertical axis and divided into discrete spaced apart thief segments that are located about the cathode;
• and
• a source connected to each thief segment for applying differential potentials to the thief segments.

A plating apparatus comprising:

• a plating bowl for providing a first portion of a plating solution;
• a circular plating cup located in the plating bowl for providing a second portion of the plating solution, the plating cup having top and bottom portions and a top circular rim that is centered about a vertical axis;
• a conduit and a pump interconnecting the plating bowl to a bottom portion of the plating cup to recirculate the plating solution by transfer from the plating bowl to the bottom portion of the plating cup, then upwardly in the plating cup and over the circular rim back into the plating bowl;
• an anode located within the bottom portion of the plating cup and a cathode located adjacent the top portion of the plating cup, the cathode being capable of supporting a workpiece with a plating surface of the workpiece facing downwardly to receive an upward flow of the plating solution;
• a plating solution distributor located in the plating cup between the anode and the cathode in a spaced relationship therebetween and centered about said vertical axis;
• a motor for relatively rotating the cathode and the plating solution distributor with respect to one another;
• the plating solution distributor for distributing the plating solution over said plating surface of the workpiece at a volume that increases radially away from said vertical axis;
• the plating solution distributor including:
• a hollow central hub centered about said vertical axis and connected to the conduit and the pump for receiving the plating solution;
• a plurality of hollow arms connected to the central hub and radially extending therefrom, the hollow arms in fluid communication with the central hub for receiving the plating solution therefrom;
• each hollow arm having a plurality of top located openings for facing the plating surface of the workpiece;
• and
• the openings in each arm increasing in size from the hub to a terminal end of the arm so that each arm discharges an increasing volume of plating solution from the hub to said terminal end;
• said motor for rotating the arms;
• means for retaining the cathode and workpiece in a fixed relationship relative to the plating cup;
• an annular thief centered about the vertical axis and divided into discrete spaced apart thief segments that are located about the cathode;
• and
• a source connected to each thief segment for applying differential potentials to the thief segments.

A plating apparatus comprising:

• a plating bowl for providing a first portion of a plating solution;
• a circular plating cup located in the plating bowl for providing a second portion of the plating solution, the plating cup having top and bottom portions and a top circular rim that is centered about a vertical axis;
• a conduit and a pump interconnecting the plating bowl to a bottom portion of the plating cup to recirculate the plating solution by transfer from the plating bowl to the bottom portion of the plating cup, then upwardly in the plating cup and over the circular rim back into the plating bowl;
• an anode located within the bottom portion of the plating cup and a cathode located adjacent the top portion of the plating cup, the cathode being capable of supporting a workpiece with a plating surface of the workpiece facing downwardly to receive an upward flow of the plating solution;
• a plating solution distributor located in the plating cup between the anode and the cathode in a spaced relationship therebetween and centered about said vertical axis;
• a motor for relatively rotating the cathode and the plating solution distributor with respect to one another;
• the plating solution distributor for distributing the plating solution over said plating surface of the workpiece at a volume that increases radially away from said vertical axis;
• the conduit having an outlet for discharging the plating solution into a region between the anode and the plating solution distributor;
• said plating solution distributor including:
• a flat circular plate centered about said vertical axis, the plate having a plurality of apertures for transferring plating solution from said region to the cathode and plating surface of the workpiece;
• and
• each aperture increasing in size along a radial from said vertical axis to a periphery of the plate;
• an annular thief centered about the vertical axis and divided into discrete spaced apart thief segments that are located about the cathode;
• and
• a source connected to each thief segment for applying differential potentials to the thief segments.

A plating apparatus comprising:

• a plating bowl for providing a first portion of a plating solution;
• a circular plating cup located in the plating bowl for providing a second portion of the plating solution, the plating cup having top and bottom portions and a top circular rim that is centered about a vertical axis;
• a conduit and a pump interconnecting the plating bowl to a bottom portion of the plating cup to recirculate the plating solution by transfer from the plating bowl to the bottom portion of the plating cup, then upwardly in the plating cup and over the circular rim back into the plating bowl;
• an anode located within the bottom portion of the plating cup and a cathode located adjacent the top portion of the plating cup, the cathode being capable of supporting a workpiece with a plating surface of the workpiece facing downwardly to receive an upward flow of the plating solution;
• a plating solution distributor located in the plating cup between the anode and the cathode in a spaced relationship therebetween and centered about said vertical axis;
• a motor for relatively rotating the cathode and the plating solution distributor with respect to one another;
• the plating solution distributor for distributing the plating solution over said plating surface of the workpiece at a volume that increases radially away from said vertical axis;
• the conduit having an outlet for discharging the plating solution into a region between the anode and the plating solution distributor;
• said plating solution distributor including:
• a flat circular plate centered about said vertical axis, the plate having a plurality of apertures for transferring plating solution from said region to the cathode and plating surface of the workpiece;
• each aperture increasing in size along a radial from said vertical axis to a periphery of the plate;
• said motor for rotating the plate about the vertical axis;
• means for retaining the cathode and workpiece in a fixed relationship relative to the plating cup;
• an annular thief centered about the vertical axis and divided into discrete spaced apart thief segments that are located about the cathode;
• and
• a source connected to each thief segment for applying differential potentials to the thief segments.

A plating apparatus comprising:

• a plating bowl for providing a first portion of a plating solution;
• a circular plating cup located in the plating bowl for providing a second portion of the plating solution, the plating cup having top and bottom portions and a top circular rim that is centered about a vertical axis;
• a conduit and a pump interconnecting the plating bowl to a bottom portion of the plating cup to recirculate the plating solution by transfer from the plating bowl to the bottom portion of the plating cup, then upwardly in the plating cup and over the circular rim back into the plating bowl;
• an anode located within the bottom portion of the plating cup and a cathode located adjacent the top portion of the plating cup, the cathode being capable of supporting a workpiece with a plating surface of the workpiece facing downwardly to receive an upward flow of the plating solution;
• a plating solution distributor located in the plating cup between the anode and the cathode in a spaced relationship therebetween and centered about said vertical axis;
• a motor for relatively rotating the cathode and the plating solution distributor with respect to one another;
• the plating solution distributor for distributing the plating solution over said plating surface of the workpiece at a volume that increases radially away from said vertical axis;
• the conduit having an outlet for discharging the plating solution into a region between the anode and the plating solution distributor;
• said plating solution distributor including:
• a flat circular plate centered about said vertical axis, the plate having a plurality of apertures for transferring plating solution from said region to the cathode and plating surface of the workpiece;
• and
• each aperture increasing in size along a radial from said vertical axis to a periphery of the plate;
• the plate having a periphery which is fixed to an inside surface of the plating cup and is sealed thereto;
• said motor for rotating the cathode and the workpiece;
• an annular thief centered about the vertical axis and divided into discrete spaced apart thief segments that are located about the cathode;
• and
• a source connected to each thief segment for applying differential potentials to the thief segments.