US 5,989,346 A · Semiconductor processing apparatus

Abstract

In a semiconductor processing apparatus, an external transfer mechanism transfers substrates between a cassette for storing a plurality of target substrates by vertically arranging the substrates at first intervals, and a processing section for performing semiconductor processing for the substrates. The external transfer mechanism has first and second arms defining first and second support surfaces each of which can support one of the substrates and capable of vertically moving relative to each other. An interval adjuster is disposed to adjust an interval in a vertical direction between the first and second support surfaces by moving the first and second arms relative to each other. An arm driving base is disposed to move the first and second arms between a position at which the first and second arms oppose the cassette and a position at which the first and second arms oppose the processing section. The thickness of each of the first and second arms in the vertical direction is smaller than the first interval. The first and second arms can be set in an overlapping state, in which the first and second arms overlap each other in a horizontal direction, by the interval adjuster. By simultaneously operating the first and second arms, processed and unprocessed substrates can be exchanged at once in the cassette.

Claims27

Dependent claims

A semiconductor processing apparatus comprising:

a storage section for storing a plurality of target substrates by vertically arranging the substrates at first intervals;
an external transfer mechanism for unloading the substrates from said storage section;
and
a processing section into which the substrates are loaded by said external transfer mechanism and which performs semiconductor processing for the substrates,
wherein said external transfer mechanism comprises
first and second arms defining first and second support surfaces each of which can support one of the substrates and capable of vertically moving relative to each other,
an interval adjuster for adjusting an interval in a vertical direction between the first and second support surfaces by moving said first and second arms relative to each other, and
an arm driving base for moving said first and second arms between a position at which said first and second arms oppose said storage section and a position at which said first and second arms oppose said processing section, and
wherein a thickness in the vertical direction of each of said first and second arms is smaller than said first intervals, and said first and second arms can be set in an overlapping state, in which said first and second arms overlap each other in a horizontal direction, by said interval adjuster.

6 more elements

A semiconductor processing apparatus comprising:

a storage section for storing a plurality of target substrates by vertically arranging the substrates;
an external transfer mechanism for unloading the substrates from said storage section;
and
a processing section into which the substrates are loaded by said external transfer mechanism and which performs semiconductor processing for the substrates,
wherein said processing section comprises
a work table for supporting one of the substrates,
a first support member which can be selectively set in an advanced state for supporting one of the substrates in a first position above said work table and a retreated state,
a second support member which can be selectively set in an advanced state for supporting one of the substrates in a second position above said work table and a retreated state, the first and second positions being so arranged as to be vertically stacked, and
an internal transfer mechanism for loading and unloading the substrates onto and from said work table, said internal transfer mechanism comprising a transfer member having first and second holding portions each of which can hold one of the substrates and which are vertically stacked in correspondence with the first and second positions, and
wherein with a first substrate as one of the substrates being held by said first holding portion of said transfer member and a second substrate as another one of the substrates being supported by said second support member, said first and second support members are vertically moved in opposite directions relative to said transfer member while said transfer member is positioned at a predetermined forward position above said work table, thereby transferring the first substrate from said first holding portion to said first support member and the second substrate from said second support member to said second holding portion.

7 more elements

A semiconductor processing apparatus comprising:

a storage section for storing a plurality of target substrates by vertically arranging the substrates;
an external transfer mechanism for unloading the substrates from said storage section, said external transfer mechanism having first and second arms defining first and second support surfaces each of which can support one of the substrates and which are vertically stacked;
a first load-lock chamber that said first and second arms can access through a gate and which can be set in a reduced pressure atmosphere;
a transfer chamber which is connected to said first load-lock chamber via a gate and can be set in a reduced pressure atmosphere;
a first processing chamber which is connected to said transfer chamber via a gate and performs semiconductor processing in a reduced pressure atmosphere;
and
an internal transfer mechanism disposed in said transfer chamber to transfer the substrates between said first load-lock chamber and said first processing chamber, said internal transfer mechanism comprising a transfer member having first and second holding portions each of which can hold one of the substrates and which are vertically stacked,
wherein said first load-lock chamber has first and second support levels each of which can support one of the substrates and which are vertically stacked, and comprises a plurality of support pins capable of vertically moving through the first and second levels and cooperating to support one of the substrates.

5 more elements

Dependencies are inferred from the claim text.

Semiconductor processing apparatus

Life of this patent

Semiconductor processing apparatus

Life of this patent

Abstract

Claims27