Cleaning solution and cleaning method
AssigneesTadhiro Ohmi, Pre-Tech Co., Ltd., Kabushiki Kaisha Ultraclean Technology Research Institute
InventorsToda Masayuki, Tadahiro Ohmi, Yasuyuki Harada
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AssigneesTadhiro Ohmi, Pre-Tech Co., Ltd., Kabushiki Kaisha Ultraclean Technology Research Institute
InventorsToda Masayuki, Tadahiro Ohmi, Yasuyuki Harada
Estimating the term…
A cleaning solution and cleaning method are provided which: (1) make treatment at room temperature possible, and do not require heating, (2) use little chemicals and water, (3) do not require specialized apparatuses, and moreover, (4) do not require the use of specialized chemicals. The cleaning solution of the present invention comprises pure water containing 20 ppb-100 ppb of oxygen and 2 ppb or more of nitrogen. Furthermore, the cleaning solution may comprise electrolytically ionized water containing OH.sup.- and containing 20 ppb-100 ppb of oxygen. In the cleaning method of the present invention, the cleaning of a material to be cleaned is conducted in a cleaning solution comprising pure water containing 20 ppb-100 ppb of oxygen and 2 ppb-15 ppm of nitrogen, while applying ultrasound having a frequency of 30 kHz or more. Furthermore, in the cleaning method of the present invention, the cleaning of a material to be cleaned may be conducted in a cleaning solution comprising electrolytically ionized water containing OH.sup.- and containing 20 ppb-100 ppb of oxygen, while applying ultrasound having a frequency of 30 kHz or more.
A cleaning solution, comprising pure water containing 20 ppb-100 ppb of oxygen and 2 ppb or more of nitrogen, said pure water having impurities present at a level of 10 ppb or less.
A cleaning solution, comprising electrolytically ionized water containing OH', and containing 20 ppb-100 ppb of oxygen, said water having impurities present at a level of 10 ppb or less.
A cleaning method, wherein the cleaning of a material to be cleaned is conducted in a cleaning solution comprising pure water and containing 20 ppb-100 ppb of oxygen, and 2 ppb-15 ppm of nitrogen, while applying ultrasound having a frequency of 30 kHz or more.
A cleaning method, wherein cleaning of a material to be cleaned is conducted in a cleaning solution comprising electrolytically ionized water containing OH.sup.- and containing 20 ppb-100 ppb of oxygen, while applying ultrasound having a frequency of 30 kHz or more.
A cleaning method, wherein the cleaning of a material to be cleaned is conducted in a cleaning solution comprising pure water, containing 20 ppb-100 ppb of oxygen and 2 ppb or more nitrogen.
Dependencies are inferred from the claim text.