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AssigneeThe Regents of the University of California
InventorsAlfred Y. Wong, Glenn B. Rosenthal
Estimating the term…
A plasma chamber for use in isotope enrichment has a microwave feed to the ECRH microwave horns, which feed is led into the plasma chamber behind the sputter plate and perpendicular to the magnetic field for improved microwave waveguide routing and ease of microwave window handling and maintenance. Improved collector design includes a collector assembly placed behind the plasma source comprising a dump plate and flat and shield collector. A ring collector is provided outside the main plasma region in the case where two opposing magnetic mirrors are used and the resonant ions maintained between them. An improved collector assembly can also be provided by disposing the collector assembly in front of the plasma source region and having a double shield-and-slat collector for capturing high energy resonant ions or permitting passage of low energy ions therethrough. Sputter sources for nonconducting materials can be provided by using a thin surface coating applied to a metal backing. The surface coat has a thickness of approximately one ion implantation depth so that the backing plate bleeds the charge from the surface coat. The thin surface coat may continually be replenished within directed jet vapor from a plasma or a doped or filled conductive plasma sputter plate may be employed.
An improvement in a plasma chamber having a source region and an enrichment region contained within said plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising:
An improvement in a plasma chamber having a source region and an enrichment region contained within said plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising:
An improvement in a plasma chamber having a source region and an enrichment region contained within said plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising:
An improvement in a plasma chamber having a source region and an enrichment region contained within said plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising:
An improvement in a plasma chamber having a source region and an enrichment region contained within said plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising:
An improvement in a plasma chamber having a source region and an enrichment region contained within said plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising:
An improvement in a plasma chamber having a source region and an enrichment region contained within said plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising:
An improvement in a plasma chamber having a source region and an enrichment region contained within said plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising:
An improvement in a plasma chamber having a source region, and a magnetic mirror comprising a product plate and a dump plate, and wherein said magnetic mirror is disposed within said plasma chamber on the end of said plasma chamber opposing said source region so that nonresonant ions are discriminatorily disposed on a dump plate disposed behind said magnetic mirror and resonant ions are reflected to said opposing end of said plasma chamber and deposited on said product plate.
An improvement in a plasma chamber having a plasma source comprising a collector disposed behind said plasma source, said collector comprising a dump plate for back-scattered ions and a slat-and-shield assembly for collection of resonant ions.
An improvement in a plasma chamber having a plasma source and a plasma enrichment region comprising a collector disposed in front of said plasma source and comprised of a double shielded slat-and-shield assembly to permit transmission of low energy ions from said plasma source therethrough and to permit collection therein of high energy resonant ions from said plasma enrichment region.
An improvement in a plasma source in a plasma chamber having a source region comprising a plurality of ECRH microwave horns coupled to a corresponding plurality of microwave energy sources, each of said ECRH horns establishing separate ECRH zones in said source region adjacent to each other so that the ionization state of said plasma generated within said multiple ECRH zones is controllable.
An improvement in a plasma source comprising a sputter source of nonconductive material in the form of a thin coating of said nonconducting material disposed on and electrically coupled to a conductive backing plate, thickness of said coating being comparable to the ion implantation depth for incoming ions to said coating.
An improvement in a method of operating a plasma chamber having a source region and an enrichment region contained within a plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising the steps of:
An improvement in a method of operating a plasma chamber having a source region and an enrichment region contained within a plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising the steps of:
An improvement in a method of operating a plasma chamber having a source region and an enrichment region contained within a plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising the steps of:
An improvement in a method of operating a plasma chamber having a source region and an enrichment region contained within a plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising the steps of:
An improvement in a method of operating a plasma chamber having a source region and an enrichment region contained within a plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising the steps of:
An improvement in a method of operating a plasma chamber having a source region and an enrichment region contained within a plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising the steps of:
An improvement in a method of operating a plasma chamber having a source region and an enrichment region contained within a plasma chamber said source region provided with a plasma source for producing a plasma, said improvement comprising the steps of:
An improvement in a method of operating a plasma chamber having a source region and an enrichment region contained within a plasma chamber, said source region provided with a plasma source for producing a plasma, said improvement comprising the steps of:
Dependencies are inferred from the claim text.