Method of making a phase mask and mask for use in near-ultra-violet formation of refractive-index grating
AssigneeD-Star Technologies, Inc.
InventorDmitry S. Starodubov
Life of this patent
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Abstract
A method of making a phase mask for imposing on light transmitted therethrough an interference pattern. The method comprises various steps including the step of depositing a solidifiable material on a substrate with a first surface relief pattern. The solidifiable material is selected so that the phase mask is at least half as transmissive as it is absorptive of light characterized by a spectral line having a wavelength between 275 and 390 nm. The material is solidified and removed from the substrate so as to yield the phase mask with a second surface relief pattern complementary to the first surface relief pattern.
Claims21
A method of making a phase mask for imposing on light transmitted therethrough an interference pattern, said method comprising the steps of:
- depositing a solidifiable material on a substrate with a first surface relief pattern, said solidifiable material being selected so that said phase mask is at least half as transmissive as it is absorptive of light characterized by a spectral line having a wavelength between 275 and 390 nm;
- solidifying said material;
- and
- removing said material from said substrate so as to yield a mask with a second surface relief pattern complementary to said first surface relief pattern.
A phase mask for imposing on light transmitted therethrough an interference pattern, said mask comprising:
- a structure of material other than fused silica, said structure being at least half as transmissive as absorptive of light characterized by a predetermined spectral line having a characteristic wavelength between 275 and 390 nm, said structure defining a spatially varying optical path length for producing said interference pattern.
Dependencies are inferred from the claim text.