Method of forming a filter for a solid-state image sensing device
AssigneeSony Corporation
InventorsHiroaki Mizoguti, Syunji Horiuchi, Youichi Hirotani, Yukihiro Sayama
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Abstract
In a method of forming a color filter for use in a solid-state image sensing device forming a color filter made of a resist material on a planarized layer made of a thermosetting resin formed on the surface of a solid-state image sensing device, a temperature for the heat treatment upon forming the color filter is defined as equal to or higher than 205.degree. C. and less than 220.degree. C., so that occurrence of micro-cracks in the planarized layer made of the thermosetting resin can be prevented.
Claims4
A method of forming an on-chip filter comprising a step of forming a planarized layer made of a thermosetting resin on the surface of a device and a step of coating a resist material on the planarized layer and, subsequently, applying a heat treatment at a temperature equal to or higher than 205.degree. C. and less than 220.degree. C., wherein the thermosetting resin is an acrylic resin.
A method of forming a solid-state image sensing device comprising a step of forming a planarized layer made of a thermosetting resin on the surface of a solid-state image sensing device and a step of coating a resist material on the planarized layer and, subsequently, applying a heat treatment at a temperature equal to or higher than 205.degree. C. and less than 220.degree. C., wherein the thermosetting resin is an acrylic resin.
Dependencies are inferred from the claim text.