Method for manufacturing multilayer wiring board and wiring pattern forming apparatus
AssigneeHitachi, Ltd.
InventorsShigemasa Satoh, Kenichi Sugeno, Haruhiko Matsuyama
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AssigneeHitachi, Ltd.
InventorsShigemasa Satoh, Kenichi Sugeno, Haruhiko Matsuyama
Estimating the term…
To form in a batch manner a thin-film wiring pattern in high precision over an entire region of a ceramics multilayer wiring board containing distortion and deformation, a correction amount of the ceramics multilayer wiring board (rotation angle and movement amount of position of this ceramics multilayer wiring board) is calculated in a computer by applying, for instance, the least squares method to positional coordinate values of each of the LSI mounting areas of the ceramics multilayer board and also to positional coordinate values corresponding thereto on a photomask. A support apparatus for supporting the multilayer wiring board is controlled based upon the calculated correction amount, so that the multilayer wiring board can be aligned with respect to the photomask.
A method for manufacturing a multilayer wiring board by forming an insulating film and a wiring pattern on a wiring board, wherein:
A thin-film wiring pattern forming apparatus comprising:
A method for forming a thin-film wiring pattern by repeatedly executing plural times a step for forming an insulating film made of an organic insulating material on a multilayer wiring board, and a step for forming a conductor pattern made of a conductive member on said insulating film, wherein:
Dependencies are inferred from the claim text.