Method of fabricating thin film transistor array
AssigneeNEC Corporation
InventorsTakahiko Watanabe, Osamu Sukegawa
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AssigneeNEC Corporation
InventorsTakahiko Watanabe, Osamu Sukegawa
Estimating the term…
There is provided a method of fabricating a thin film transistor array having a transparent insulating substrate, a plurality of thin film transistors formed on the substrate in a matrix, a gate bus line connected to gate electrodes of the thin film transistors, a drain bus line connected to drain electrodes of the thin film transistors, and a pixel electrode driven by the thin film transistors, the method including the steps of forming the gate electrode and the gate bus line on the transparent insulating substrate, forming a gate insulating film over the substrate, forming an operative semiconductor on the gate insulating film, forming the source electrodes, drain electrodes, and drain bus line of the thin film transistors on the gate insulating film and the operative semiconductor, forming a protection film all over the substrate, removing a portion of both the gate insulating film and the protection film, located above a terminal of the gate bus line, and also removing a portion of the protection film located above a terminal of the drain bus line, and forming the pixel electrode on the substrate. The above-mentioned method makes it possible to make a gate bus line and a drain bus line appear by only one photolithography step. Hence, the above-mentioned method needs to carry out only five photolithography steps to fabricate a thin film transistor array, whereas the conventional methods have to carry out six photolithography steps.
A method of fabricating a thin film transistor array comprising a transparent insulating substrate, a plurality of thin film transistors formed on said substrate in a matrix, a gate bus line connected to gate electrodes of said thin film transistors, a drain bus line connected to drain electrodes of said thin film transistors, and a pixel electrode driven by said thin film transistors, said method comprising the steps of:
A method of fabricating a thin film transistor array comprising a transparent insulating substrate, a plurality of thin film transistors formed on said substrate in a matrix, a gate bus line connected to gate electrodes of said thin film transistors, a drain bus line connected to drain electrodes of said thin film transistors, an auxiliary capacitive bus line, and a pixel electrode driven by said thin film transistors, said thin film transistor array controlling liquid crystal by a horizontal field produced between said pixel electrode and said auxiliary capacitive bus line, said method comprising the steps of:
Dependencies are inferred from the claim text.