Desensitizing solution for lithography
AssigneeFuji Photo Film Co., Ltd.
InventorsSeishi Kasai, Ryosuke Itakura, Eiichi Kato
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Abstract
A desensitizing solution for lithography is disclosed which contains at least one member selected from acyclic amine and ammonium compounds each containing specific structures. The desensitizing solution does not cause environmental pollution, is stable to long-term storage, continuous use, and fluctuations in environmental conditions, is effective in reducing the time required for etching treatment, and has excellent desensitization performance.
Claims8
A desensitizing solution for lithography which contains at least one acyclic amine or ammonium compound which contains at least two groups represented by formula (I) and has a weight average molecular weight of 1.times.10.sup.3 or higher:
- ##STR65## wherein R.sub.0 represents --PO.sub.3 H.sub.2, --OPO.sub.3 H.sub.2, or a salt of either.
Dependencies are inferred from the claim text.