Back to results
US 5,965,034 AGranted
High frequency plasma process wherein the plasma is executed by an inductive structure in which the phase and anti-phase portion of the capacitive currents between the inductive structure and the plasma are balanced
AssigneeMC Electronics Co., Ltd.
InventorsGeorgy Vinogradov, Shimao Yoneyama
Life of this patent
Estimating the term…
Abstract
A process for fabricating a product including the steps of subjecting a substrate to a composition of entities, at least one of the entities emanating from a species generated by a plasma excited by a high frequency field provided by an inductive coupling structure in which the phase and anti-phase capacitive currents into the plasma are substantially balanced.
Claims20
A process for fabricating a product comprising the steps of:
- (1) generating a gaseous discharge using an inductive coupling structure which couples phase and anti-phase capacitive currents to the gaseous discharge;
- (2) subjecting a substrate to entities, at least one of which emanates from a species generated by the gaseous discharge excited by a high frequency field;
- and (3) substantially balancing the phase and anti-phase capacitive currents.
A process for fabricating a product comprising the steps of:
- (1) generating a plasma using a helical resonator having a coil having elements and a surrounding shield having a surrounding shield potential;
- (2) capacitively coupling plasma to certain elements of the coil which have a potential greater than the surrounding shield potential, thereby driving a first current, and capacitively coupling plasma to other elements of the coil which have a potential below the surrounding shield potential, thereby driving a second current;
- and (3) subjecting a substrate to a composition of entities and employing the resulting substrate for completion of the product, at least one of the entities emanating from a species generated by the plasma, the integral of the first current being substantially equal to the integral of the second current.
Apparatus for fabricating a product, the apparatus comprising:
- an enclosure comprising an outer surface and an inner surface, the enclosure housing a gaseous discharge;
- an inductive coupling structure disposed adjacent to the outer surface;
- a high frequency power source operably coupled to the inductive coupling structure, the high frequency power source and inductive coupling structure being adapted to excite the gaseous discharge in a manner to provide at least one entity from a high frequency field in which the vector sum of phase and anti-phase capacitive current coupled from the inductive coupling structure substantially balances.
Dependencies are inferred from the claim text.