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US 5,965,002 AGranted
Elecrodeposition of manganese and other hard to deposit metals
OwnerBassey J. Udofotinventor
Life of this patent
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Abstract
A method of codepositing iron and manganese having a high proportion of manganese incorporates use of a new electrochemical cell. The deposit comprises up to 38% manganese from a solution of wide ranging pH from an aqueous bath of sulfate, phosphate salt or any other type of bath, The deposits may subsequently be nitrided, phosphatized or carburized to produced an amorphous surface comparable to Hadfield steel. The manganese alloy deposit exhibits a bright, shiny surface.
Claims15
A method of depositing a hard-to-deposit metal alloy onto a substrate comprising the steps of:
- a) placing a hard-to-deposit metal anode into a first chamber of an electrochemical cell having at least two chambers and containing an electrolyte solution wherein the hard-to-deposit is selected from the group consisting of manganese, vanadium, titanium and zirconium;
- b) placing an iron-containing anode into a second chamber of the electrochemical cell;
- c) placing a cathode into the first chamber of the electrochemical cell;
- d) passing electricity through the electrochemical cell for a time sufficient to cause deposition of iron and hard-to-deposit metal alloy onto the cathode;
- e) allowing the deposition to continue until the desired amount of deposition is achieved;
- f) stopping the flow of electricity;
- and
- g) removing the cathode which has been deposited with the iron and hard-to-deposit metal alloy.
5 more elements
Dependencies are inferred from the claim text.