Double-sided substrate cleaning apparatus and cleaning method using the same
AssigneesTokyo Electron Limited, Tokyo Electron Kyushu Limited
InventorsHiroyuki Matsukawa, Akira Yonemizu, Michiaki Matsushita, Akihiro Fujimoto, Takashi Takekuma, Hidetami Yaegashi, Takahide Fukuda
Life of this patent
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Abstract
There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.
Claims4
A method for cleaning both surfaces of a substrate, comprising:
- (a) a first cleaning step of conveying a substrate into a first cleaning mechanism and supplying a treatment liquid to a first surface of the substrate with a brush kept in contact therewith, so as to clean the first surface, said first surface being a surface on which a pattern is to be formed;
- (b) a second cleaning step of conveying the substrate into a second cleaning mechanism and supplying a treatment liquid to a second surface of the substrate with a brush kept in contact therewith, so as to clean the second surface, said second surface being a surface on which no pattern is to be formed, wherein a force with which the brush is pressed against the second surface in step (b) is greater than a force with which the brush is pressed against the first surface in said step (a), and wherein the brush used for scrubbing and cleaning the first surface in said step (a) is substantially similar to the brush used for scrubbing and cleaning the second surface in said step (b);
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- (c) a step of taking the substrate out from one of said first cleaning mechanism and said second cleaning mechanism and reversing the substrate by means of a reversing mechanism located outside of the first and second cleaning mechanisms, and then conveying the substrate for cleaning by the other of said first cleaning mechanism and said second cleaning mechanism.
A method for cleaning both surfaces of a substrate, comprising the steps of:
- (a) a first cleaning step of conveying a substrate into a first cleaning mechanism and supplying a treatment liquid to a first surface of the substrate, with a brush kept in contact therewith, so as to clean the first surface, said first surface being a surface on which a pattern is to be formed;
- (b) a second cleaning step of conveying the substrate into a second cleaning mechanism and supplying a treatment liquid to a second surface of the substrate, with a brush kept in contact therewith, so as to clean the second surface, said second surface being a surface on which no pattern is to be formed, wherein a force with which the brush is pressed against the second surface in step (b) is greater than a force with which the brush is pressed against the first surface in step (a), and wherein the brush used for scrubbing and cleaning the first surface in said step (a) is substantially similar to the brush used for scrubbing and cleaning the second surface in said step (b);
- (c) a step of taking the substrate out from one said first cleaning mechanism and said second cleaning mechanism and reversing the substrate by means of a reversing mechanism located outside of the first and second cleaning mechanism, and then conveying the substrate for cleaning by the other of said first cleaning mechanism and said second cleaning mechanism;
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- (d) conveying the substrate into a heat treatment apparatus after and second surface of the substrate are cleaned.
Dependencies are inferred from the claim text.