Removable pumping channel liners within a chemical vapor deposition chamber

A set of channel liners comprising metals and including:

• a first annular liner shaped in a band and having a first major diameter;
• a second annular liner shaped in a band and having a second major diameter greater than said first major diameter;
• and
• a third annular liner having a radially extending portion extending between said first major diameter and said second major diameter and an axially extending portion connected thereto and having said second major diameter.

A plasma reactor, comprising:

• a main processing chamber including a pedestal for supporting thereon a substrate to be processed;
• an inlet for admitting processing gas into said chamber;
• a pumping channel surrounding a periphery of said chamber, connected thereto by a restricted passageway, and connectable to vacuum pumping system;
• and
• a ceramic first liner and a ceramic second liner forming walls of said pumping channel and defining therebetween said passageway, wherein said first liner includes at least one annular groove facing said pumping channel.