Method for producing near net shape planar sputtering targets and an intermediate therefor

An assembly useful in the production of sputtering targets comprising:

• a first backing plate;
• a first powder layer abutting said first backing plate;
• a spacer abutting said first powder layer opposite said first backing plate;
• a second powder layer abutting said spacer opposite said first powder layer;
• and
• a second backing plate abutting said second powder layer opposite said spacer.

A method for producing sputtering targets comprising the steps of

• machining first and second metal backing plates to form a first machined surface having a first profile corresponding to a near net profile of a first ion source on said first backing plate and a second machined surface having a first profile corresponding to a near net profile of a second ion source on said second backing plate;
• positioning said first backing plate in a can with said first machined surface exposed;
• pouring a first metal powder on said first backing plate to form a first powder layer;
• smoothing said first powder layer to form a flat surface opposite said first machined surface;
• placing a spacer on said flat surface;
• pouring a second metal powder on said spacer to form a second powder layer;
• arranging said second powder layer to form a powder surface opposite said spacer having a powder surface profile complementary to said second profile;
• placing said second backing plate against said second powder layer with said second machined surface facing said powder surface;
• sealing said can;
• and
• isostatically pressing said first and second backing surfaces and first and second powder layers to consolidate said first and second powder layers to form first and second consolidated layers, and to simultaneously bond said first and second consolidated layers to said first and second backing plates.