SOI transistor having a self-aligned body contact
AssigneeInternational Business Machines Corporation
InventorsKlaus Dietrich Beyer, Taqi Nasser Buti, Chang-Ming Hsieh, Louis Lu-Chen Hsu
Life of this patent
Estimating the term…
Loading patent…
AssigneeInternational Business Machines Corporation
InventorsKlaus Dietrich Beyer, Taqi Nasser Buti, Chang-Ming Hsieh, Louis Lu-Chen Hsu
Estimating the term…
SOI Transistor Having a Self-aligned Body Contact An SOI transistor has a self-aligned body contact formed through an extension to the gate, thereby forming the body contact with minimal increase in area and also avoiding the need to tie the source to the body, as in prior art schemes that passed the body contact through the source. The body contact aperture is formed by raising the source and drain to define an initial aperture, depositing a conformal layer that is etched to create aperture-defining sidewalls and etching the contact aperture using these sidewalls to define sidewall support members that support insulating sidewalls to isolate the collection electrode from both the gate and from the source and drain.
An SOI field effect transistor having a self-aligned body contact and comprising a source and drain doped with a first polarity and formed in a silicon layer, having a silicon top surface, doped with a second polarity and disposed above an insulating substrate, and a gate insulator and gate, having a gate top surface, disposed above a body portion of said silicon layer between said source and drain and extending a gate length along a first axis passing between said source and drain, further comprising:
A pair of SOI field effect transistors comprising a first and second source and drain formed in a silicon substrate, having a silicon top surface, disposed above an insulating substrate, and first and second gate insulators and first and second gates disposed above first and second body portions of said silicon layer between said first and second source and drain and extending a gate length along a first axis, said first and second gates being aligned along a second axis perpendicular to said first axis and further comprising:
Dependencies are inferred from the claim text.