Process for the aftertreatment of betaines and amphoteric surfactants
AssigneeHenkel Kommanditgesellschaft auf Aktien (KGaA)
InventorsGunter Uphues, Uwe Ploog, Rainer Jeschke, Renate Schick
Life of this patent
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Abstract
Process for the aftertreatment of betaine and amphoteric surfactants comprising adjusting the pH to the range of from 11 to 14 by addition of an alkali metal hydroxide, followed by a thermal aftertreatment if the surfactant contains dichloroacetic acid residues.
Claims20
A process for reducing the content of dichloroacetic acid in a water-containing paste or solution of a betaine surfactant containing dichloroacetic acid residues wherein the betaine surfactant is at least one compound of the formula I or II ##STR3## in which R.sup.1 is an alkyl or alkenyl radical containing from 6 to about 22 carbon atoms, and R.sup.2 and R.sup.3 independently of one another represent an alkyl or hydroxyalkyl radical containing 1 to 4 carbon atoms, ##STR4## in which R.sup.4 CO is a saturated or unsaturated acyl radical containing 6 to 22 carbon atoms, R.sup.5 is hydrogen or an alkyl or hydroxyalkyl radical containing 1 to 4 carbon atoms, R.sup.5 is an alkyl or hydroxyalkyl radical containing 1 to 4 carbon atoms, and n=2 or 3, comprising the steps of
- A) adding an alkali metal hydroxide to said paste or solution until a pH in the range of from about 11 to about 14 is obtained;
- and
- B) thermally treating the resulting mixture until a significant reduction in residual dichloroacetic acid is achieved.
A process for stabilizing against microbial contamination a water-containing paste or solution of a betaine or amphoteric surfactant free from dichloroacetic acid residues comprising adding an alkali metal hydroxide to said paste or solution until a pH in the range of from about 11 to about 14 is obtained.
Dependencies are inferred from the claim text.