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US 5,962,197 AGranted
Alkaline organic photoresist stripper
AssigneeAnalyze Inc.
InventorZhao Chen
Life of this patent
Estimating the term…
Abstract
A stripper for removing photoresist or solder masks has a composition of 30-80% by weight of a propylene glycol ether; 10-60% by weight of a pyrrolidone; 0.1-5% by weight of potassium hydroxide; 0.1-10% by weight of a surfactant; 0-20% by weight 1,3-butanediol; 0-10% by weight 2-(2-aminoethoxy) ethanol; and a water content of <1%.
Claims9
An alkaline-containing photoresist stripping composition comprising:
- a propylene glycol ether;
- a pyrrolidone;
- potassium hydroxide;
- a surfactant;
- and
- a water content of less than one percent.
3 more elements
An alkaline-containing photoresist stripping composition comprising:
- ______________________________________ propylene glycol ether 30-80% by weight N-alkyl-2-pyrrolidone 10-60% by weight potassium hydroxide 0.1-5% by weight surfactant 0.1-10% by weight amino-ethanol 0-10% by weight ______________________________________
- wherein said composition is characterized by a water content of less than one percent, and
- whereby said composition is able to remove photoresist in the presence of metal without substantially corroding the metal.
Dependencies are inferred from the claim text.