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US 5,962,138 AGranted
Plasma deposited substrate structure
AssigneeTalison Research
InventorsOmprakash S. Kolluri, Robert G. Johanson
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Abstract
A substrate structure having three-dimensional functional film network comprising a plurality of radio frequency discharge plasma film layers. The plasma film layers include a first layer, comprising a plurality of a first functional group, and a second layer, comprising a plurality of a second functional group. The employment of three-imensional film networks with desired functional groups located either on the periphery or both the periphery and interstitial spaces of the networks provides means for significantly increasing the surface functional density.
Claims11
A substrate structure, comprising:
- a substrate having a surface thereon;
- and
- a plurality of radio frequency discharge plasma film layers said film layers being sequentially deposited on said substrate surface, said plasma film layers including a first layer and a second layer at least partially covalently bonded to said first layer;
- said second layer having a substantially ordered geometric structure, said structure including a plurality of substantially uniformly dispersed interstitial spaces;
- said first layer including a plurality of a first functional group;
- said second layer including a plurality of a second functional group.
3 more elements
Dependencies are inferred from the claim text.