Methods of depositing films on polymer substrates

A method of depositing a silicon oxide film on a polymer substrate by plasma Chemical Vapor Deposition comprising the steps:

• applying a magnetic field to a plasma generating chamber by activating a magnetic coil positioned around the plasma generating chamber;
• introducing an Electron Cyclotron Resonance plasma generating gas into the chamber;
• introducing microwaves into the plasma generating chamber to thereby generate an Electron Cyclotron Resonance plasma;
• feeding a supply gas comprising a silicon-containing compound from an inlet downstream of the plasma generating chamber and in fluid communication therewith;
• providing the polymer substrate at a location downstream of the inlet;
• passing the Electron Cyclotron Resonance plasma through a single earthed mesh positioned between the inlet and the polymer substrate or between the plasma generating chamber and the inlet;
• and
• contacting the polymer substrate with the Electron Cyclotron Resonance plasma passed through the mesh and the supply gas to thereby deposit a silicon oxide film on a surface of the polymer substrate.