Process for fabricating layered superlattice materials and AB0.sub.3 type metal oxides without exposure to oxygen at high temperatures

A method of fabricating a layered superlattice compound, said method comprising:

• providing a substrate, and a precursor containing metal moieties in effective amounts for spontaneously forming said layered superlattice compound upon heating said precursor;
• applying said precursor to said substrate;
• drying said precursor to form a solid thin film;
• and
• heating said solid thin film on said substrate without exposing it to oxygen while at a temperature of higher than 600.degree. C. to form said layered superlattice compound on said substrate.

A method of fabricating an ABO.sub.3 type metal oxide thin film of a few thousand angstroms or less in thickness, said method comprising:

• providing a substrate, and a precursor containing metal moieties in effective amounts for spontaneously forming said metal oxide upon heating said precursor;
• applying said precursor to said substrate;
• drying said precursor to form a solid thin film;
• rapid thermal processing said dried solid thin film in an atmosphere including oxygen at a temperature of 500.degree. C. or less;
• and then
• heating said solid thin film on said substrate without exposing it to oxygen while at a temperature of higher than 600.degree. C. to form said metal oxide thin film on said substrate.