Method and device for manufacturing a thin film and magnetic recording medium
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsKazuyoshi Honda, Yoshiharu Maezawa, Masaru Odagiri, Sadayuki Okazaki
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Abstract
A method and a device for manufacturing a thin film by a vacuum deposition method, and a magnetic recording medium produced thereby are disclosed. A thin film of high quality is mass-produced while introducing reaction gas to a thin film forming section from a nozzle consisting of minute tubes, so that the flow of evaporated atoms is not disturbed by the reaction gas.
Claims14
A method of manufacturing a thin film on a substrate by a vacuum deposition method, wherein said thin film is formed while introducing reaction gas including oxygen, and wherein said reaction gas is provided from a nozzle comprising minute tubes, and
- wherein the minute tubes have a nozzle length (L) that is at least 10 times greater than an inner diameter (D) of the minute tubes, and a ratio of the inner diameter (D) to a center distance between neighboring minute tubes (X) is from 1:1 to 1:4.
A method of manufacturing a thin film, wherein a magnetic layer is formed on a long macromolecular substrate directly or via a bottom layer by an electron beam deposition method;
- wherein metal used for forming said magnetic layer is deposited on said substrate through a main aperture formed in a shielding plate, gas including oxygen is directed from a deposition end side of said main aperture to said substrate, and oxygen gas flux is directed to a thin film forming area from a sub-aperture formed in said shielding plate on a deposition starting side of said main aperture;
- said substrate running along a supporting body in a vacuum;
- and said shielding plate regulating the direction of said metal and
- wherein the oxygen gas flux is provided from the sub-aperture to the thin film forming section, so that an at least 6 nm thick non-magnetic layer is formed by reaction deposition.
A method of manufacturing a thin film, wherein a magnetic layer is formed on a long macromolecular substrate directly or via a bottom layer by an electron beam deposition method;
- wherein metal used for forming said magnetic layer is deposited on said substrate from an aperture formed in a shielding plate, gas including oxygen is oriented to said substrate from a deposition end side of said aperture, and oxygen gas flux is directed to the middle of said aperture from a nozzle located outside of vapor used for forming said magnetic layer;
- said substrate running along a supporting body in a vacuum;
- and said shielding plate regulating the direction of said metal.
A method of manufacturing a thin film, wherein a magnetic layer is formed on a long macromolecular substrate directly or via a bottom layer by an electron beam deposition method;
- wherein metal used for forming said magnetic layer is deposited on said substrate from a first aperture and a second aperture formed in a shielding plate, and gas including oxygen is directed to said substrate from at least a deposition end side of said second aperture;
- said substrate running in a vacuum along a supporting body;
- said shielding plate regulating the direction of said metal;
- wherein a magnetic layer formed at said first aperture is thicker and closer to said substrate than a magnetic layer formed at said second aperture.
Dependencies are inferred from the claim text.