Method for removing deleterious deposits from a surface
OwnerEunice Cooper-Trotterinventor
Life of this patent
Estimating the term…
Abstract
A method for removing a scuff mark from a shoe surface made from a synthetic material comprises the steps of: applying a fingernail polish remover composition to the shoe surface with a cotton ball; rubbing the composition into the surface; and removing the scuff mark and the composition from the surface. The composition may consist essentially of acetone; water; glycerin; diglycerol; and gelatin. The composition may alternately consist essentially of ethyl acetate; isopropyl alcohol; water; benzophenone 1; isopropyl myristate; butyl acetate; and mineral salts containing sodium, potassium, magnesium, calcium, chloride, bromide, iodide, sulfate, and carbonate. Still further, the composition may alternately consist essentially of other nail polish remover compositions.
Claims17
A method for removing a deleterious deposit from a surface, the surface being other than a human nail, the method comprising the steps of:
- applying a fingernail polish remover composition to the surface with an applicator;
- rubbing the composition into the surface, wherein the deleterious deposit is a scuff mark;
- and
- removing the deleterious deposit and the composition from the surface.
A method for removing a scuff mark from a shoe surface made from a synthetic material, the method comprising the steps of:
- applying a fingernail polish remover composition to the shoe surface with a cotton ball;
- rubbing the composition into the surface;
- and
- removing the scuff mark and the composition from the surface.
Dependencies are inferred from the claim text.