Distribution plate for a reaction chamber with multiple gas inlets and separate mass flow control loops

An apparatus for performing chemical vapor deposition and etching comprising:

• a reaction chamber;
• gas distribution means for distributing a reactant gas over a substrate mounted in said reaction chamber, said gas distribution means having at least one partition disposed on a surface thereof for separating said gas distribution means into at least two gas distribution zones over said substrate, said distribution means mounting to an interior surface of the reaction chamber to form a cavity between said interior surface and the planar member;
• and
• means for regulating the flow of gas into said gas distribution zones including a gas control circuit for independently regulating a flow of a same reactant gas in each of the at least two gas distribution zones such that a substantially uniform reactant gas distribution is achieved over the substrate.

An apparatus for performing chemical vapor deposition and etching comprising:

• a reaction chamber having an interior surface;
• a plate member attached to said interior surface of said chamber so that a space is created between said plate member and said interior surface of said chamber, said plate member including a plurality of apertures that extend therethrough;
• at least one partition disposed in said space between said plate member and said interior surface, said partition separating said space into at least two gas distribution zones;
• a plurality of gas inlet lines, each of said gas inlet lines supplying a same vapor to one of said at least two gas distribution zones;
• and
• at least one mass flow controller connected to each of said gas inlet lines, said at least one mass flow controller regulating flow of vapor to each of said gas distribution zones, in accordance with a gas control circuit for independently regulating a flow of the vapor in each of the at least two gas distribution zones such that a substantially uniform reactant gas distribution is achieved over a substrate.