Method of manufacturing an optical device with a groove accurately formed
AssigneeNEC Corporation
InventorsSatoru Mizuta, Hiroshi Nishimoto
Life of this patent
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Abstract
A first layer (2) and a second layer (3) are formed on a substrate (1). The first layer is made of a resist against a groove-sculpturing etchant used in etching the substrate while the second layer is made of an anti-corrosive material against dry etching. The second layer is at first patterned into a patterned second layer (3a) in the form of a groove-sculpturing mask pattern (8). With the patterned second layer used as a mask, the first layer is etched and patterned into a patterned first layer (2a) in the form of the above-mentioned mask pattern. With the patterned first layer used as a mask, the substrate is etched to form a groove (9).
Claims4
A method of manufacturing an optical device having a groove, comprising the steps of:
- forming, on a substrate, a first layer of a first resist comprising silicon nitride to serve to mask groove-sculpting etching;
- forming, on a part of said first layer, a second layer of a second resist, said second resist comprising an upper plane, and said second resist being selected to be resistant to dry etching, and said second layer being patterned to define a groove area and shape;
- carrying out a first etching of said first layer located within said groove area to expose an area of said substrate;
- carrying out a second etching of said area of said substrate located within said groove area thereby to form a groove for accepting an optical fiber;
- and
- subsequent to said forming a second layer, forming an optical waveguide layer at a plane above said upper plane.
Dependencies are inferred from the claim text.