Method for in situ cleaning of electron emitters in a field emission device
AssigneeMotorola, Inc.
InventorsBabu Chalamala, Arthur J. Ingle, Charles Rowell, Thomas L. Credelle
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Abstract
A method for in situ cleaning of electron emitters (126, 226, 326, 526) in a field emission device (100, 200, 300, 400, 500) includes the steps of controllably providing hydrogen gas (142, 242, 342, 542) within the field emission device (100, 200, 300, 400, 500) at a time during the operational life of the field emission device (100, 200, 300, 400, 500) and, thereafter, emitting electrons from the electron emitters (126, 226, 326, 526), thereby forming hydrogen free radicals, which decontaminate and condition the emissive surfaces of the electron emitters (126, 226, 326, 526).
Claims21
A method for in situ cleaning of electron emitters in a field emission device comprising the steps of:
- introducing hydrogen gas into the field emission device at a time subsequent to sealing of the field emission device;
- and
- thereafter, forming hydrogen free radicals from the hydrogen gas.
A method for in situ cleaning of electron emitters in a field emission device having an evacuated interspace region, the method comprising the steps of:
- providing a hydrogen source within the evacuated interspace region of the field emission device;
- releasing hydrogen gas from the hydrogen source;
- and
- thereafter, forming hydrogen free radicals from the hydrogen gas.
A method for in situ cleaning of electron emitters in a field emission device comprising the steps of:
- sealing the field emission device;
- and
- thereafter, adjusting a partial pressure of hydrogen gas within the field emission device in a manner sufficient to maintain stable electron emission having fluctuations within a tolerable range.
Dependencies are inferred from the claim text.