Process to form light-receiving member with outer layer made by alternately forming and etching
AssigneeCanon Kabushiki Kaisha
InventorsShigenori Ueda, Junichiro Hashizume, Makoto Aoki, Shinji Tsuchida
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AssigneeCanon Kabushiki Kaisha
InventorsShigenori Ueda, Junichiro Hashizume, Makoto Aoki, Shinji Tsuchida
Estimating the term…
In a reactor capable of reducing an internal pressure thereof, a non-single-crystalline material layer containing at least one kind of carbon atoms, hydrogen atoms or nitrogen atoms is formed and etched on a non-single-crystalline photoconductive layer mainly composed of silicon atoms, formed on a substrate, under application of a high-frequency power of 50 MHz to 450 MHz, and the formation and the etching are alternately repeated plural times to form a surface layer. A light-receiving member having such a surface layer does not damage cleaning performance over a long period of time, hardly allows adhesion of corona discharge products, and can be free from faint images, smeared images and uneven image density even if no heating means for the drum is provided.
A process for producing a light-receiving member which comprises the steps of:
A process for producing a light-receiving member which comprises the steps of:
A process for producing a light-receiving member comprising the steps of:
A process for producing a light-receiving member which comprises the steps of:
Dependencies are inferred from the claim text.