Method and apparatus for forming a thin polymer layer on an integrated circuit structure

A process of forming a thin polymer layer on the surface of an object, comprising:

• positioning an object within a deposition chamber;
• vaporizing a polymerizable material into a carrier gas stream;
• maintaining one or more walls of the deposition chamber at a temperature above the polymerization temperature of the polymerizable material;
• maintaining the object at a temperature below the condensation temperature of the polymerizable material,
• flowing the vaporized polymerizable material and the carrier gas stream into the deposition chamber;
• maintaining a B field within the deposition chamber;
• and
• depositing a thin polymer layer onto the object.

An apparatus for forming a thin polymer layer on the surface of an object, comprising:

• a processing chamber having a sidewall and a lid;
• a substrate support member disposed in the lower portion of the chamber;
• a gas inlet adapted to provide reactive monomer into the chamber;
• a chiller adapted to cool the substrate support member;
• a magnet assembly adapted to provide a B field to enhance the deposition rate of the polymerizable material onto the object and
• a heater adapted to heat the sidewall of the processing chamber;
• wherein the sidewall of the processing chamber is maintainable at a temperature to prevent condensation of the reactive monomer thereon and the substrate support member is maintainable at a temperature to allow condensation of the reactive monomer thereon.

An apparatus for forming a thin polymer layer on the surface of an object, comprising:

• a vaporization chamber adapted to vaporize a polymerizable material into a carrier gas stream;
• and
• a deposition chamber in fluid communication with the vaporization chamber and adapted to receive the carrier gas and vaporized polymerizable material, the deposition chamber having:
• a support member adapted to receive an object;
• a chiller adapted to cool the object below the condensation temperature of the polymerizable material so that a thin layer of the polymerizable material is deposited on the object and allowed to form a polymer layer;
• and
• a magnet assembly adapted to provide a B field.

An apparatus for forming a thin polymer layer on the surface of an object, comprising:

• a first vaporization chamber adapted to vaporize a first polymerizable material into a first carrier gas stream;
• and
• a second vaporization chamber adapted to vaporize a second polymerizable material into a second carrier gas stream;
• a deposition chamber in fluid communication with the first and second vaporization chambers and adapted to receive the first and second vaporized polymerizable material, the deposition chamber having:
• a support member adapted to receive an object;
• and
• a chiller adapted to cool the object below the condensation temperature of the first and second polymerizable materials;
• and a magnet assembly adapted to provide a B field to enhance the deposition rate of the polymerizable material onto the object.