Method for removal of moisture from gaseous HCl
AssigneeAir Products and Chemicals, Inc.
InventorsChun Christine Dong, Thomas Hsiao-Ling Hsiung, Timothy Christopher Golden
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Abstract
An adsorbent and method for removing water from gaseous HCl. MgCl.sub.2 supported on an activated carbon or silica gel substrate activated by heating to a temperature between 150.degree. C. (302.degree. F.) and 300.degree. C. (572.degree. F.) under vacuum will remove water at partial pressures of below 0.5 torr. Activation of the MgCl.sub.2 supported adsorbent can also be effected by heating the adsorbent between 270.degree. C. (518.degree. F.) and 400.degree. C. (752.degree. F.) under nitrogen.
Claims3
A method of removing water from gaseous HCl wherein the water contained in the HCl is at a partial pressure of between 0.01 to 0.5 torr by passing the HCl stream containing water over an adsorbent consisting of between 5 to 15% by weight MgCl.sub.2 supported on an activated carbon substrate.
Dependencies are inferred from the claim text.